PHOTONIX EDGE LLC

Your distributor of Photonic Solutions

Operating Wavelength

​(nm)

Material

Aperture

​(mm x mm)

Frequency Shift

​(MHz)

Polarization

Resolution T.DF

Deflection angle range


Diffraction

efficiency

​(%)

Part number
375 - 1,600
TeO2
4.5 x 4.5
f(λ)
Linear
300 @ 633nm
48 @ 633nm
> 70
DTSX-250
7.5 x 7.5
500 @ 633nm
DTSX-400

2 Axis

TeO2

4.5 x 4.5
300 x 300 @ 633nm
41 x 41 @ 532 nm
> 45
DTSXY-250
7.5 x 7.5
500 x 500 @ 633nm
DTSXY-400
400 - 450
TeO2
0.5 x 17.5
230 +/- 60
500
11.4 @ 400nm
>50
DT230-B120A0.5-UV
450 - 670
15 @ 532nm
DT230-B120A0.5-VIS


Low Resolution

AOM: DEFLECTORS

& VAR FREQ SHIFTERS

Operating Wavelength

​(nm)

Material

Aperture

​(mm x mm)

Frequency Shift

​(MHz)

POL

Resolution T.DF

Deflection angle range


Diffraction

efficiency

​(%)

Part number
244 - 266
Fused Silica
1.50 x 2.00
200 +/- 15
Linear

5

1.3 @ 266nm

>60

MQ200-B30A1.5-244.266-Br

325 - 425
1.00 x 2.00
110 +/- 15
10
1.8 @ 355nm
MQ110-B30A1-UV
400 - 442
TeO2
0.50 x 2.00
200 +/- 25

Linear or

Random

23
5.4 @ 458mm
>80
MT200-B50A0,5-400.442
450 - 700
0.50 x 2.00
250 +/- 50
47
12.6 @ 532nm

>70 @ 633nm

MT200-B100A0.5-VIS
1.00 x 2.00
110 +/- 25
23
6.3 @ 532nm
>65 @ 633nm
MT110-B50A1-VIS
1.50 x 2.00
MT110-B50A1.5-VIS
1.00 x 2.00
80 +/- 15
14
3.8 @ 532nm
>65
MT80-B30A1-VIS
1.50 x 2.00
MT80-B30A1.5-VIS
750 - 950
0.50 x 2.00
200 +/- 50
Linear or
Random
47
18.6 @ 785nm
>60
MT200-B100A0.5-800
1.00 x 2.00
200 +/- 20
19
7.4 @ 800nm
> 70 @ 785nm
MT200-B40A1-800
0.20 x 1.00
350 +/- 60
28
22.8 @ 800nm
>60
MT350-B120A0.12-800
0.50 x 1.00
250 +/- 50
47
19 @ 800nm
MT250-B100A0.5-800
0.50 x 2.00
200 +/- 50

> 60 @ 785nm

MT200-B100A0.5-800
700 - 1,100
1.00 x 2.00
110 +/- 25

Linear or
Random

23
9.5 @ 800nm
MT110-B50A1-IR
1.50 x 2.00
MT110-B50A1.5-IR
1.00 x 2.00
80 +/- 15
14
5.7 @ 800nm

> 70 @ 785nm

MT80-B30A1-IR
1.50 x 2.00
>70 @ 765nm
MT80-B30A1.5-IR
980 - 1,100
0.40 x 2.00
200 +/- 50

Linear or
Random

47
25.3 @ 1064nm
>35
MT200-B100A0.5-1064
0.20 x 1.00
>60
MT200-B100A0.2-1064
1.00 x 2.00
110 +/- 25
23
12.6 @ 1064nm
>55
MT110-B50A1-1064
1.50 x 2.00
110 +/- 15
14
7.6 @ 1064nm
>60
MT110-B30A1.5-1064
1.00 x 2.00
80 +/- 15
MT80-B30A1-1064
1.50 x 2..00
MT80-B30A1.5-1064


High Resolution


A Bragg configuration  gives a single first order output beam, which intensity is directly linked to the power of RF control signal, and which angle is directly linked to the RF frequency.

By varying the frequency, the output laser beam angle is modified.

A deflector is used to scan a laser beam over a range of angles, or to control with accuracy the output angle of the laser beam. By varying the frequency, the first order beam is also frequency shifted by the amount of the RF carrier frequency: it acts like a variable frequency shifter.

The main parameters to qualify a deflector are deflection angle range and resolution.

The deflection angle range is the maximum angle variation of the laser beam: it is linked to the frequency range of the device.

The resolution of a deflector is the number of distinct directions that can be targeted by the deflector: it is linked to the deflection angle range and laser divergence.

Two deflectors can be used in series to provide full two-dimensional scanning.​.